Subjects were assigned in two groups: In group 1, subjects received LLL and LED 20 min/day for 10 days after implant insertion, subjects in group 2did not undergo LLL and LED. implant stability quotients(ISQs) were measured in 0,10,21,42 and 63 days after implant placement.
Subjects eligible for study inclusion had an edentulous area at the first molar of the mandible and needed a dental implant. Subjects were excluded from study enrollment if they had any diseases that affect bone, smoking, insufficient bone in the edentulous area which needs bone augmentation, failed to return for follow-up, or refused study enrollment. All implants were placed at least 3 months after tooth removal. The size of implants was 4.8X 10 mm (Zimmer, USA) Subjects were aligned based on computer randomization in two groups: In group 1(intervention), subjects received LLL and LED after implant placement and in group 2 (control) the same device was used while device was off. A portable device was applied for irradiation of the intervention group with combination of 810nm laser and 632nm LED. Subjects in group 1 underwent LLL 15 mw/cm2 and LED 10 mw/cm2 20 min every day for 10 days. The mesiodistal and buccolingual directions were measured and the mean implant stability quotients (ISQs) were determined. The RFA measurements were performed in immediate after insertion (time0) 10 days (time1), 3 weeks (time2), 6 weeks(time3) and 9(time 4) weeks after implant placement.
Study Type
INTERVENTIONAL
Allocation
RANDOMIZED
Purpose
OTHER
Masking
NONE
Enrollment
28
Combination of Low-Level Laser and Light-Emitting Diodes were used after dental implant placement for enhancement of stability
A dental implant with 4.8X 10 mm (Zimmer, USA) size was placed at the posterior of the mandible
Resonance frequency analysis
The stability of the implants was evaluated with resonance frequency analysis by the Osstell device
Time frame: Immidate after implant placement (time 0)
Resonance frequency analysis
The stability of the implants was evaluated with resonance frequency analysis by the Osstell device
Time frame: 10 days (time1) after implant placement
Resonance frequency analysis
The stability of the implants was evaluated with resonance frequency analysis by the Osstell device
Time frame: Three weeks after implant placement (time 2)
Resonance frequency analysis
The stability of the implants was evaluated with resonance frequency analysis by the Osstell device
Time frame: Six weeks after implant placement (time 3)
Resonance frequency analysis
The stability of the implants was evaluated with resonance frequency analysis by the Osstell device
Time frame: Nine weeks after implant placement(time 4)
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